#Core shell atomic layer deposition free#

By applying hundreds of cycles of alternate core precursors and co-reactants, the nanoparticles of core material were deposited. However, higher overpotentials and lower limiting currents were observed with ALD Pt-WC compared to Pt/C catalysts, indicating that the oxygen reduction mechanism is not as efficient on Pt-WC as on bulk Pt. Core-shell nanoparticle structures of noble metals with tunable size and thickness have been fabricated using atomic layer deposition (ALD) in recent years 27, 28. In this study, BVO was deposited using atomic layer deposition (ALD) of alternating films of bismuth and vanadium oxides. The mass and specific activities for the 30 and 50 ALD cycle samples were found to be comparable to a 10 wt. % Pt/C catalyst. Deposition, Atomic layer deposition Abstract Bismuth vanadate (BVO) is a promising metal oxide semiconductor for photoelectrochemical water oxidation. The Pt-WC samples were evaluated for the oxygen reduction reaction using a rotating disk electrode to obtain quantitative activity information.

#Core shell atomic layer deposition free#

However, excess free carbon was found to affect Pt ALD by blocking adsorption sites on WC. The photocatalytic activity of the g-CNALD-TiO coreshell composites was examined using the degradation of rhodamine B dye under visible light irradiation. It consists of the alternation of separate. TEM imaging and Cu stripping voltammetry found that Pt ALD growth on WC powder substrates was similar to that on WC thin films. AbstractAtomic layer deposition (ALD) is a vapor phase technique capable of producing a variety of materials.

A range of Pt depositions were used to determine the growth mechanism for the Pt-WC powder system.

Pt-WC core shell particles were produced using atomic layer deposition (ALD) to deposit Pt layers onto WC particle substrates.